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[Gee76]  Computer-Aided Coarse Grid Layout Technique for Photomasks

Geer:1976:CAC (Article)
Author(s)Geer R.
Title« Computer-Aided Coarse Grid Layout Technique for Photomasks »
JournalACM SIGGRAPH Computer Graphics, Proceedings of ACM SIGGRAPH 76 (Philadelphia, PA, July 14--16, 1976)
Volume10
Number3
Page(s)302--307
Year1976
AddressNew York

Abstract
A comprehensive computer-aided mask layout technique has been developed which permits quick conversion of LSI circuits into working photomasks. It is an efficient solution to the problem when the demand for customized circuit layouts greatly overshadows the more standardized techniques. No computer background or programming experience is required. This approach allows the designer to quickly compose high-density mask layouts using simple free-hand line symbols. These easily drawn symbols, representing complex circuitry, utilize a standard device-level building block library which simplifies the conversion of LSI circuits into photomasks, and permits the designer to generate up to 100% of the layout without leaving his desk.

BibTeX code
@article{Geer:1976:CAC,
  number = {3},
  month = jul,
  author = {Ronald G. Geer},
  optkey = {},
  series = CGPACS,
  localfile = {papers/Geer.1976.CAC.pdf},
  address = {New York},
  publisher = {ACM Press},
  doi = {http://doi.acm.org/10.1145/563274.563330},
  organization = {ACM SIGGRAPH},
  journal = SIGGRAPH76,
  volume = {10},
  optstatus = {URL},
  title = {{C}omputer-{A}ided {C}oarse {G}rid {L}ayout {T}echnique for
           {P}hotomasks},
  abstract = {A comprehensive computer-aided mask layout technique has been
              developed which permits quick conversion of LSI circuits into
              working photomasks. It is an efficient solution to the problem
              when the demand for customized circuit layouts greatly overshadows
              the more standardized techniques. No computer background or
              programming experience is required. This approach allows the
              designer to quickly compose high-density mask layouts using simple
              free-hand line symbols. These easily drawn symbols, representing
              complex circuitry, utilize a standard device-level building block
              library which simplifies the conversion of LSI circuits into
              photomasks, and permits the designer to generate up to 100\% of
              the layout without leaving his desk.},
  year = {1976},
  pages = {302--307},
}

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