@article{Geer:1976:CAC,
  number = {3},
  month = jul,
  author = {Ronald G. Geer},
  optkey = {},
  series = CGPACS,
  localfile = {papers/Geer.1976.CAC.pdf},
  address = {New York},
  publisher = {ACM Press},
  doi = {http://doi.acm.org/10.1145/563274.563330},
  organization = {ACM SIGGRAPH},
  journal = SIGGRAPH76,
  volume = {10},
  optstatus = {URL},
  title = {{C}omputer-{A}ided {C}oarse {G}rid {L}ayout {T}echnique for
           {P}hotomasks},
  abstract = {A comprehensive computer-aided mask layout technique has been
              developed which permits quick conversion of LSI circuits into
              working photomasks. It is an efficient solution to the problem
              when the demand for customized circuit layouts greatly overshadows
              the more standardized techniques. No computer background or
              programming experience is required. This approach allows the
              designer to quickly compose high-density mask layouts using simple
              free-hand line symbols. These easily drawn symbols, representing
              complex circuitry, utilize a standard device-level building block
              library which simplifies the conversion of LSI circuits into
              photomasks, and permits the designer to generate up to 100\% of
              the layout without leaving his desk.},
  year = {1976},
  pages = {302--307},
}