@inproceedings{Wyvill:2004:RCB,
  optorganization = {},
  author = {Brian Wyvill and Kees van Overveld and Sheelagh Carpendale},
  optkey = {},
  optseries = {},
  editor = {Aaron Hertzmann and Craig Kaplan},
  localfile = {papers/Wyvill.2004.RCB.pdf},
  address = {New York},
  publisher = {ACM Press},
  optmonth = {},
  doi = {http://doi.acm.org/10.1145/987657.987667},
  opturl = {},
  optcrossref = {},
  booktitle = NPAR2004,
  optstatus = {},
  optvolume = {},
  title = {{R}endering {C}racks in {B}atik},
  optnumber = {},
  abstract = {We present an algorithm for simulating the cracks found in Batik
              wax painting and dyeing technique used to make images on cloth.
              The algorithm produces cracks similar to those found in batik due
              to the wax cracking in the dyeing process. The method is unlike
              earlier simulation techniques used in computer graphics, in that
              it is based on the Distance Transform algorithm rather than on a
              physically based simulation such as using spring mass meshes or
              finite element methods. Such methods can be difficult to implement
              and computationally costly due to the large numbers of equations
              that need to be solved. In contrast, our method is simple to
              implement and takes only a few seconds to produce convincing
              patterns that capture many of the characteristics of the crack
              patterns found in real Batik cloth.},
  year = {2004},
  pages = {61--70},
}